Equipment Name: Wafer Texturing Equipment

Equipment Model: CC-TE-1000

Equipment Application: Used for  texturing and cleaning of the wafers in silicon solar cell manufacturing.

Process Flow:

Pre-cleaning→DI water rinsing→saw damage removal (SDE)→DI water rinsing→alkaline texturing→DI water rinsing→DI water rinsing→SC1→DI water rinsing→Chemical Polishing(O3)→DI water rinsing→SC2 treatment→DI water rinsing→HF cleaning→DI water rinsing→hot water pulling→warm air drying

Features:

1、Suitable with MES, UPS and RFID functions.

2、Reliable and optimized structures of the lifts which can avoid cross-contamination of chemical liquid and reaction overtime of process bath effectively.

3、With compact and reasonable structural layout, acid area, alkaline area and high cleanness area separated by partition, with small footprint.

4、Advanced double-layer bath structure improves the throughput effectively.

5、Process baths combines the “feed & bleed” Mode with “Time Dosing” Mode, will extend the bath life time and reduce the bath change period effectively. 

6、Dosing and Make-up adopt linear detection of the double magnetostrictive flowmeter inside the bath and the dosing barrel, as well as adjustable valve flow control structure to ensure the time of initial make-up and accurate dosing effectively.

7、Optimize and upgrade all materials in contact with process liquid to avoid  precipitation of impurities.

8、Incorporated with the latest low-temperature drying technology to ensure the cleanliness and temperature control accuracy inside the bath.