Equipment Name: PECVD Equipment

Equipment Model: CC-PE-1000

Equipment Application: Used for deposition of various silicon thin film on the wafer in solar cell manufacturing.

Typical Process Flow for HJT Application

Wafer loading - Chamber pumping - Heating - Backside i layer deposition - Frontside i layer deposition - Backside doping layer deposition - Chamber venting - Wafer unloading

Equipment Advantages

● Capable of both n type and p type micro-crystalline silicon deposition

● High quality amorphous silicon passivation technology

● Inline multi-chamber quasi-dynamic PECVD coating technique

● Large size chamber design, high throughput, light load, low thermal budget, better carrying tray flatness and excellent film uniformity

● Inline corrosion resistant magnetic fluid bearing & unique vacuum transfer design for large size tray

● RF plasma fast ignition setting and real-time plasma glow monitoring