Equipment Name: PVD Equipment

Equipment Model: CC-PV-1000

Equipment Application: Used for deposition of various TCO films on the wafer in solar cell manufacturing.

Typical Process Flow for HJT Application

Wafer loading - Chamber pumping - Backside TCO deposition - Frontside TCO depostion - Chamber venting - Wafer unloading

Equipment Advantages

● Rotating target design for the better target utilization 

● TCO film coating with excellent uniformity cross the tray

● Design of chamber structure with high productivity and low breakage rate

● Maximum Capacity（14400pcs@ half G12, 600mw for single equipment)

● Composite structural tray design with large size, light load, low thermal budget, expansion and high flatness 

● PVD cathode structure design of high magnetism, low temperature and high sputtering rate